Multi-target sputtering machine (DC~2+RF~1(selective), max 500 deg.)

Vertical Bridgman furnace

Pt coater

Economical CVD equipment

Resistive thermal evaporation (3 sources)

Floating zone furnace
(transferred from Dept. of Physics, U Tokyo
(laboratories of Prof. Hasegawa and Prof. Uchida))

RF-sputtering machine (3 cathodes; one for magnetic materials)
(transferred from Dept. of Mechano-Informatics, U Tokyo
(laboratory of Prof. Shimoyama))

3-zone furnace

Electric furnaces (box furnaces, tube furnace, vacuum furnace)

Magnetic annealing furnace (max 220 deg.)


X-ray fluorescence spectrometer (XRF)

Draft chamber (UV Ozone Cleaner, Ultrasonic Cleaner, Hot Plate), Drying Oven

Low Speed Saw


Metallographic Microscope (+differential interferometer)

Laser Microscope

Laser Displacement Meter

Scanning Probe Microscope
(transferred from Dept. of Materials Engineering, U Tokyo
(laboratories of Prof. Ichinose and Prof. Yamaguchi))

Real Surface View (SEM) VE-7800

Maskless Lithography

GM Cryocooler + Electromagnet(max. 1T)+ Motorized rotation stage

Laser Doppler Vibrometer + FFT Analyzer

He Optistat (with Laser Doppler Vibrometer)

1.2T electromagnet

(transferred from NEC corporation)

(Common Equipment in Dept. of Basic Science)