Multi-target sputtering machine (DC×2+RF×1(selective), max 500 deg.)




Vertical Bridgman furnace




Pt coater




Economical CVD equipment




Resistive thermal evaporation (3 sources)




Floating zone furnace
(transferred from Dept. of Physics, U Tokyo
(laboratories of Prof. Hasegawa and Prof. Uchida))




RF-sputtering machine (3 cathodes; one for magnetic materials)
(transferred from Dept. of Mechano-Informatics, U Tokyo
(laboratory of Prof. Shimoyama))




3-zone furnace




Electric furnaces (box furnaces, tube furnace, vacuum furnace)




Magnetic annealing furnace (max 220 deg.)




Glovebox




X-ray fluorescence spectrometer (XRF)




Draft chamber (UV Ozone Cleaner, Ultrasonic Cleaner, Hot Plate), Drying Oven




Low Speed Saw




Polisher




Metallographic Microscope (+differential interferometer)




Laser Microscope




Laser Displacement Meter




Scanning Probe Microscope
(transferred from Dept. of Materials Engineering, U Tokyo
(laboratories of Prof. Ichinose and Prof. Yamaguchi))





Real Surface View (SEM) VE-7800





Maskless Lithography




GM Cryocooler + Electromagnet(max. 1T)+ Motorized rotation stage




Laser Doppler Vibrometer + FFT Analyzer




He Optistat (with Laser Doppler Vibrometer)




1.2T electromagnet




PPMS-9T
(transferred from NEC corporation)




MPMS-5T
(Common Equipment in Dept. of Basic Science)