OUR FACILITIES
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Multi-target sputtering machine (DC×2+RF×1(selective), max 500 deg.)
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Vertical Bridgman furnace
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Pt coater
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Economical CVD equipment
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Resistive thermal evaporation (3 sources)
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Floating zone furnace
(transferred from Dept. of Physics, U Tokyo
(laboratories of Prof. Hasegawa and Prof. Uchida))
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RF-sputtering machine (3 cathodes; one for magnetic materials)
(transferred from Dept. of Mechano-Informatics, U Tokyo
(laboratory of Prof. Shimoyama))
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3-zone furnace
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Electric furnaces (box furnaces, tube furnace, vacuum furnace)
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Magnetic annealing furnace (max 220 deg.)
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manual 2D transfer system
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Glovebox
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X-ray fluorescence spectrometer (XRF)
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Draft chamber (UV Ozone Cleaner, Ultrasonic Cleaner, Hot Plate), Drying Oven
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Low Speed Saw
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Polisher
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Metallographic Microscope (+differential interferometer)
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Laser Microscope
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Laser Displacement Meter
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Scanning Probe Microscope
(transferred from Dept. of Materials Engineering, U Tokyo
(laboratories of Prof. Ichinose and Prof. Yamaguchi))
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Real Surface View (SEM) VE-7800
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Maskless Lithography
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GM Cryocooler + Electromagnet(max. 1T)+ Motorized rotation stage
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Laser Doppler Vibrometer + FFT Analyzer
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He Optistat (with Laser Doppler Vibrometer)
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laser-based MOKE system
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1.2T electromagnet
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PPMS-9T
(transferred from NEC corporation)
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Low-T Probe Station (2.5 T) (transferred from TMU)
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MPMS-5T
(Common Equipment in Dept. of Basic Science)
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