OUR FACILITIES

: Multi-target sputtering machine (DC×2+RF×1(selective), max 500 deg.)

: Vertical Bridgman furnace

: Pt coater

: Economical CVD equipment

: Resistive thermal evaporation (3 sources)

: Floating zone furnace (transferred from Dept. of Physics, U Tokyo (laboratories of Prof. Hasegawa and Prof. Uchida))

: RF-sputtering machine (3 cathodes; one for magnetic materials) (transferred from Dept. of Mechano-Informatics, U Tokyo (laboratory of Prof. Shimoyama))

: 3-zone furnace

: Electric furnaces (box furnaces, tube furnace, vacuum furnace)

: manual 2D transfer system

: Magnetic annealing furnace (max 220 deg.)

: Glovebox

: X-ray fluorescence spectrometer (XRF)

: electrolytic crystallization system (in incubator)

: Draft chamber (UV Ozone Cleaner, Ultrasonic Cleaner, Hot Plate), Drying Oven

: Low Speed Saw

: Polisher

: Metallographic Microscope (+differential interferometer)

: Laser Microscope

: Laser Displacement Meter

: Real Surface View (SEM) VE-7800

: Maskless Lithography

: GM Cryocooler + Electromagnet(max. 1T)+ Motorized rotation stage

: N2 cryostat

: Laser Doppler Vibrometer + FFT Analyzer

: He Optistat (with Laser Doppler Vibrometer)

: laser-based MOKE system

: 1.2T electromagnet

: PPMS-9T (transferred from NEC corporation)

: PPMS-9T(transferred from A. Maeda lab.)

: MPMS-5T (Common Equipment in Dept. of Basic Science)